专利名称：METHODS AND SYSTEMS FOR
SEMICONDUCTOR FABRICATION WITHLOCAL RETICLE MANAGEMENT
发明人：Chinmay S. Oza申请号：US13245576申请日：20110926
公开号：US20130079912A1公开日：20130328
专利附图：
摘要：A method and system of semiconductor fabrication are provided. In themethod, an equipment unit performs a process on substrates using a current reticle. The
equipment unit also communicates processing data to a local reticle controller. The localreticle controller schedules removal of the current reticle from the equipment unit anddelivery of a subsequent reticle to the equipment unit based on the processing data forfurther substrate processing.
申请人：Chinmay S. Oza
地址：Mechanicville NY US
国籍：US
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