专利名称:METHODS AND SYSTEMS FOR
SEMICONDUCTOR FABRICATION WITHLOCAL RETICLE MANAGEMENT
发明人:Chinmay S. Oza申请号:US13245576申请日:20110926
公开号:US20130079912A1公开日:20130328
专利附图:
摘要:A method and system of semiconductor fabrication are provided. In themethod, an equipment unit performs a process on substrates using a current reticle. The
equipment unit also communicates processing data to a local reticle controller. The localreticle controller schedules removal of the current reticle from the equipment unit anddelivery of a subsequent reticle to the equipment unit based on the processing data forfurther substrate processing.
申请人:Chinmay S. Oza
地址:Mechanicville NY US
国籍:US
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