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METHODS AND SYSTEMS FOR SEMICONDUCTOR FABRICATION

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专利名称:METHODS AND SYSTEMS FOR

SEMICONDUCTOR FABRICATION WITHLOCAL RETICLE MANAGEMENT

发明人:Chinmay S. Oza申请号:US13245576申请日:20110926

公开号:US20130079912A1公开日:20130328

专利附图:

摘要:A method and system of semiconductor fabrication are provided. In themethod, an equipment unit performs a process on substrates using a current reticle. The

equipment unit also communicates processing data to a local reticle controller. The localreticle controller schedules removal of the current reticle from the equipment unit anddelivery of a subsequent reticle to the equipment unit based on the processing data forfurther substrate processing.

申请人:Chinmay S. Oza

地址:Mechanicville NY US

国籍:US

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