专利名称：Condenser and method of manufacturing
the same
发明人：藤井 裕雄申请号：JP2017218048申请日：20171113公开号：JP2019091749A公开日：20190613
专利附图：
摘要：An object of the present invention is to suppress oxidation of a conductive thinfilm and to prevent the conductive thin film from peeling off from a dielectric thin film. Anelement body 4 has a metal sintered body 8 having minute pores, and a multilayer film 9
deposited in atomic layer units in a predetermined surface area including the innersurface of the pores. The multilayer film 9 is composed of a conductive thin film
containing Cu as a main component, and first and second dielectric thin films containing Aloxide as main components formed on both main surfaces of the conductive thin film. Theterminal electrode 5 a is connected to the conductive thin film, and the second terminalelectrode 5 b is connected to the sintered metal 8 through the electrode layer 3. When aCu thin film is formed on the surface of the sintered metal 8 by atomic deposition, the Cuthin film is instantaneously oxidized to form a CuOx thin film, and an oxidation-reductionreaction occurs with the Al thin film formed thereafter to conduct electricity. A multilayerfilm 9 is obtained in which dielectric thin films are formed on both main surfaces of theconductive thin film. [Selected figure] Figure 1
申请人：株式会社村田製作所
地址：京都府長岡京市東神足１丁目１０番１号
国籍：JP
代理人：國弘 安俊
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容