Method for manufacturing patterned layer and metho

专利名称：Method for manufacturing patterned layer

and method for manufacturingelectrochromic device

发明人：Chun-Hao Tu,Ren-Hong Jhan,Hao-Lun

Hsieh,Kuo-Sen Kung,Ting-Chun Lin,Jen-PeiTseng

申请号：US14186498申请日：20140221公开号：US09423663B2公开日：20160823

专利附图：

摘要：A method for manufacturing a patterned layer includes the steps of: providing asubstrate having a first surface and a second surface opposite to the first surface;

providing a material source for supplying a plurality of charged particles, in which the firstsurface faces the material source; providing a magnetic element, in which the secondsurface is arranged between the magnetic element and the first surface; and depositingthe charged particles on the first surface through using the magnetic element so as toform a patterned layer. A method for manufacturing an electrochromic device isdisclosed as well.

申请人：AU Optronics Corporation

地址：Hsin-Chu TW

国籍：TW

代理机构：WPAT, PC

代理人：Justin King,Douglas A. Hosack

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